EE3801Microsystems and Nanotechnology

What you will study

Course overview

The aim of the course is to provide students with the basic theoretical knowledge, analytical skills and laboratory experience for understanding the nanofabrication technologies for producing microelectronic circuits and microsystems. Highlighted topics include patterning, etching, deposition and doping technologies for nanostructures, devices, and microsystems.

Official PDF, page 2 · Abstract

Course content

• Overview of nanotechnology • Clean rooms facilities for nanofabrication • Lithography technology for high-resolution patterning and mass production • Dry and wet etching technologies for nanostructures, nanodevices, and microsystems • Introduction of dopants to control conductivity and form shallow junctions • Electrical contact formation and multiple level interconnects • Micro-Electro-Mechanical Systems (MEMS) and their applications

Official PDF, page 4 · Keyword Syllabus

Intended learning outcomes

View official learning outcomes and conditions

CILOs                                                Weighting (if DEC-A1          DEC-A2           DEC-A3
                                                                    app.)
1              Explain the principles of individual                                 x              x
               nanofabrication processes.
2              Apply nanotechnology to nanostructures,                              x              x
               devices and microsystems fabrication.
3              Explain the limits of nanotechnology for                             x              x
               different applications.
4              Explain the applications of different                                 x              x
               microsystems
5              Design nanotechnology for specific                                    x              x               x
               nanostructures, devices and microsystems.

Official PDF, page 2 · Course Intended Learning Outcomes (CILOs)

Before you take this course

Check prerequisites, precursors and corequisites separately, together with equivalence and exclusion conditions. “and” means conditions must be met together; “or” marks alternatives. Read combined conditions in the groupings shown in the original text below.

Prerequisites

EE2005 Electronic Devices and Circuits

Official PDF, page 1 · Prerequisites

Precursors

EE2800 Semiconductor Physics for Engineers

Official PDF, page 1 · Precursors

Corequisites

This edition of the official syllabus does not state this item.

Additional course requirements

This edition of the official syllabus does not state this item.

Equivalent courses and conditions

Nil

Official PDF, page 1 · Equivalent Courses

Exclusive courses and conditions

Nil

Official PDF, page 1 · Exclusive Courses

Assessment and passing the course

Assessment

Continuous Assessment (%): 50; Examination (%): 50; Examination Duration (Hours): 2

View the original assessment table and instructions

ATs                 CILO No.             Weighting (%)            Remarks ("-" for     Allow Use of
                                                                                        nil entry)           GenAI?
1                     Tests (min.: 2)     1, 2, 3, 4, 5        30                       -                    No
2                     #Assignments        1, 2, 3, 4, 5        15                       -                    Yes
                      (min.: 3)

3                       Lab Exercises/     2, 3, 4           5                    -                   Yes
                        Reports

Official PDF, page 3 · Continuous Assessment (%),Examination (%),Examination Duration (Hours)

Passing requirements

Minimum Examination Passing Requirement (%): 30 Additional Information for ATs: Remark: To pass the course, students are required to achieve at least 30% in course work and 30% in the examination. Also, 100% laboratory attendance rate must be obtained. # may include homework, tutorial exercise, project/mini-project, presentation

Official PDF, page 3 · Minimum Examination Passing Requirement (%),Additional Information for ATs