EE3801Microsystems and Nanotechnology

这门课学什么

课程简介

The aim of the course is to provide students with the basic theoretical knowledge, analytical skills and laboratory experience for understanding the nanofabrication technologies for producing microelectronic circuits and microsystems. Highlighted topics include patterning, etching, deposition and doping technologies for nanostructures, devices, and microsystems.

校方 PDF 第 2 页 · Abstract

课程内容

• Overview of nanotechnology • Clean rooms facilities for nanofabrication • Lithography technology for high-resolution patterning and mass production • Dry and wet etching technologies for nanostructures, nanodevices, and microsystems • Introduction of dopants to control conductivity and form shallow junctions • Electrical contact formation and multiple level interconnects • Micro-Electro-Mechanical Systems (MEMS) and their applications

校方 PDF 第 4 页 · Keyword Syllabus

预期学习成果

查看校方学习成果与对应条件

CILOs                                                Weighting (if DEC-A1          DEC-A2           DEC-A3
                                                                    app.)
1              Explain the principles of individual                                 x              x
               nanofabrication processes.
2              Apply nanotechnology to nanostructures,                              x              x
               devices and microsystems fabrication.
3              Explain the limits of nanotechnology for                             x              x
               different applications.
4              Explain the applications of different                                 x              x
               microsystems
5              Design nanotechnology for specific                                    x              x               x
               nanostructures, devices and microsystems.

校方 PDF 第 2 页 · Course Intended Learning Outcomes (CILOs)

我能不能修这门课

先修、建议先备和并修要求分别查看；等同及互斥条件也会影响选课。and 表示同时满足，or 表示备选；组合条件按下方原文分组阅读。

先修条件

EE2005 Electronic Devices and Circuits

校方 PDF 第 1 页 · Prerequisites

建议先备知识

EE2800 Semiconductor Physics for Engineers

校方 PDF 第 1 页 · Precursors

并修要求

该版官方课纲未列明该项。

其他修读要求

该版官方课纲未列明该项。

等同课程及条件

无（校方注明 Nil）

校方 PDF 第 1 页 · Equivalent Courses

互斥课程及条件

无（校方注明 Nil）

校方 PDF 第 1 页 · Exclusive Courses

怎么考，怎样才算通过

考核方式

Continuous Assessment (%): 50; Examination (%): 50; Examination Duration (Hours): 2

查看校方原始考核表与使用要求

ATs                 CILO No.             Weighting (%)            Remarks ("-" for     Allow Use of
                                                                                        nil entry)           GenAI?
1                     Tests (min.: 2)     1, 2, 3, 4, 5        30                       -                    No
2                     #Assignments        1, 2, 3, 4, 5        15                       -                    Yes
                      (min.: 3)

3                       Lab Exercises/     2, 3, 4           5                    -                   Yes
                        Reports

校方 PDF 第 3 页 · Continuous Assessment (%),Examination (%),Examination Duration (Hours)

通过条件

Minimum Examination Passing Requirement (%): 30 Additional Information for ATs: Remark: To pass the course, students are required to achieve at least 30% in course work and 30% in the examination. Also, 100% laboratory attendance rate must be obtained. # may include homework, tutorial exercise, project/mini-project, presentation

校方 PDF 第 3 页 · Minimum Examination Passing Requirement (%),Additional Information for ATs